Compounds for the prevention of glial scarring

Columbia Technology Ventures
posted on 07/01/2009

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Problem or Unmet Need Reactive gliosis is one of the root causes of scarring in the brain following traumatic brain injury, stroke, and other neurologic disorders such as epilepsy. This glial scarring can obstruct the regeneration of neurons and limit recovery of the injured brain. In cases where the injury is due to the implantation of a neuroprosthetic device, glial scarring around the device can significantly impair device function. Functional abnormalities in reactive astrocytes, especially defects in potassium and glutamate uptake, appear to contribute to continuing neurologic deficits and possibly seizures following brain injury; therefore reactive astrocytes have been proposed as a therapeutic target. No therapy capable of ameliorating reactive gliosis however is currently available. Details of the Invention Many cell processes have been identified such as glial cell division, growth, and differentiation which are indicators of reactive gliosis. One signaling pathway which has been implicated in all of these processes has been identified by the lead inventors as a general feature of reactive gliosis in the brain. It has been found to precede the development of reactive changes in glial cells following a variety of central nervous system insults. The inventors have also identified inhibitors of this signaling pathway which when administered acutely or chronically following trauma can prevent reactive gliosis. This finding has wide implications for all diseases and problems with implantable neuroprosthetics characterized by reactive gliosis or brain scarring.