iBridge Network Innovation Activity: HIGHLY PLASMA ETCH-RESISTANT PHOTORESIST COMPOSITION CONTAINING A PHOTOSENSITIVE POLYMERIC TITANIA PRECURSOR Finding the missing link in research just got easier.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi2008-05-20T04:12:45ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.eduhttp://www.ibridgenetwork.org/images?action=feed_icon.gifMissouri University of Science and TechnologyCopyright 2008, Missouri University of Science and Technology is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=1367162008-05-20T04:12:45ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=1189192008-05-15T19:21:09ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=1104982008-05-12T23:34:04ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=1077182008-05-12T20:37:22ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=949942008-05-10T13:27:37ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=949882008-05-10T13:21:35ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=863512008-05-09T07:04:50ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=863402008-05-09T07:04:26ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=863392008-05-09T07:04:24ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=863382008-05-09T07:04:22ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=650062008-05-05T21:19:17ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=547252008-05-03T14:21:17ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=353192008-04-25T00:45:28ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=271382008-04-16T16:51:51ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=271142008-04-16T16:49:59ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=271132008-04-16T16:49:53ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu is now the case manager for this innovation.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=194152008-04-11T07:36:05ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.eduStatus changed from Unpublished to Published.http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=21912008-03-13T13:40:36ZKeith Strassner, Missouri University of Science and Technologyhttp://www.ibridgenetwork.org/info/aboutkdstrass@mst.edu