iBridge Network Innovation Activity: HIGHLY PLASMA ETCH-RESISTANT PHOTORESIST COMPOSITION CONTAINING A PHOTOSENSITIVE POLYMERIC TITANIA PRECURSOR Finding the missing link in research just got easier. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi 2008-05-20T04:12:45Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu http://www.ibridgenetwork.org/images?action=feed_icon.gif Missouri University of Science and Technology Copyright 2008, Missouri University of Science and Technology is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=136716 2008-05-20T04:12:45Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=118919 2008-05-15T19:21:09Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=110498 2008-05-12T23:34:04Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=107718 2008-05-12T20:37:22Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=94994 2008-05-10T13:27:37Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=94988 2008-05-10T13:21:35Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=86351 2008-05-09T07:04:50Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=86340 2008-05-09T07:04:26Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=86339 2008-05-09T07:04:24Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=86338 2008-05-09T07:04:22Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=65006 2008-05-05T21:19:17Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=54725 2008-05-03T14:21:17Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=35319 2008-04-25T00:45:28Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=27138 2008-04-16T16:51:51Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=27114 2008-04-16T16:49:59Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=27113 2008-04-16T16:49:53Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu is now the case manager for this innovation. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=19415 2008-04-11T07:36:05Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu Status changed from Unpublished to Published. http://www.ibridgenetwork.org/university-missouri-science-technology/highly-plasma-etch-resistant-photoresist-composition-containi?activity_id=2191 2008-03-13T13:40:36Z Keith Strassner, Missouri University of Science and Technology http://www.ibridgenetwork.org/info/about kdstrass@mst.edu